Top 100 US Patents in Tubes and Lamps
section h - electricity > basic electric elements > electric discharge tubes or discharge lamps
Sorted by IPQ® Score, an objective measure of patent quality. View scores and methodology at PatentRatings.com. You can also view all by publication date instead.
US7229572 (B2), filed
Mon Dec 08 00:00:00 CST 2003
, published
Tue Jun 12 00:00:00 CDT 2007
- CABOT CORP
Photoluminescent phosphor powders and a method for making phosphor powders. The phosphor powders have a small particle size, narrow particle size distribution and are substantially spherical. The method of the invention advantageously permits the economic...
US6077384 (A), filed
Fri Feb 02 00:00:00 CST 1996
, published
Tue Jun 20 00:00:00 CDT 2000
- APPLIED MATERIALS INC
The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor window, a base within the chamber for supporting the workpiece during processing thereof, a gas inlet system...
US5864136 (A), filed
Fri Jun 20 00:00:00 CDT 1997
, published
Tue Jan 26 00:00:00 CST 1999
- TELEDYNE ELECTRONIC TECH
A mass spectrometry method in which an improved field comprising two or more trapping fields having substantially identical spatial form is established and at least one parameter of the improved field is changed to excite selected trapped ions sequentially for...
US4994676 (A), filed
Mon Jun 25 00:00:00 CDT 1990
, published
Tue Feb 19 00:00:00 CST 1991
- MOUNT BRUCE E
A scanning mass spectrometer (10) in combination with an electro-optical detector (100) which enable greatly increased speed of mass determinations by detecting a limited range of masses simultaneously, thus reducing the number of discrete magnetic field...
US5381007 (A), filed
Tue May 25 00:00:00 CDT 1993
, published
Tue Jan 10 00:00:00 CST 1995
- TELEDYNE MEC A DIVISION OF TEL
A mass spectrometry method in which an improved field comprising two or more trapping fields having substantially identical spatial form is established and at least one parameter of the improved field is changed to excite selected trapped ions sequentially,...
US5749762 (A), filed
Wed Oct 04 00:00:00 CDT 1995
, published
Tue May 12 00:00:00 CDT 1998
- TOKYO SHIBAURA ELECTRIC CO
A field emitter cold cathode has a substrate possessing a first main surface on one side of itself and a second main surface on the other side of itself and has windows formed in itself. An emitter layer is formed on the first main surface side of the...
US5210472 (A), filed
Tue Apr 07 00:00:00 CDT 1992
, published
Tue May 11 00:00:00 CDT 1993
- MICRON TECHNOLOGY INC
A flat panel display in which low-voltage row and column address signals control a much higher pixel activation voltage. Although the invention was created with field-emission displays in mind, the technique may be used in any matrix-addressable display (e.g....
US5561291 (A), filed
Thu Mar 23 00:00:00 CST 1995
, published
Tue Oct 01 00:00:00 CDT 1996
- TELEDYNE ELECTRONIC TECH
A mass spectrometry method in which an improved field comprising two or more trapping fields having substantially identical spatial form is established and at least one parameter of the improved field is changed to excite selected trapped ions sequentially for...
US6150628 (A), filed
Thu Jun 26 00:00:00 CDT 1997
, published
Tue Nov 21 00:00:00 CST 2000
- APPLIED SCIENCE TECH INC
An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primarily winding. The apparatus also includes one or...
US6338809 (B1), filed
Tue Feb 24 00:00:00 CST 1998
, published
Tue Jan 15 00:00:00 CST 2002
- SUPERIOR MICROPOWDERS LLC
Provided is an aerosol method, and accompanying apparatus, for preparing powdered products of a variety of materials involving the use of an ultrasonic aerosol generator (106) including a plurality of ultrasonic transducers (120) underlying and ultrasonically...
US6633831 (B2), filed
Thu Sep 20 00:00:00 CDT 2001
, published
Tue Oct 14 00:00:00 CDT 2003
- KLA TENCOR TECHNOLOGIES
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection...
US5007981 (A), filed
Fri Feb 09 00:00:00 CST 1990
, published
Tue Apr 16 00:00:00 CDT 1991
- HITACHI LTD
US7067070 (B2), filed
Fri Sep 26 00:00:00 CDT 2003
, published
Tue Jun 27 00:00:00 CDT 2006
- CABOT CORP
Electroluminescent phosphor powders and a method for making phosphor powders. The phosphor powders have a small particle size, narrow particle size distribution and are substantially spherical. The method of the invention advantageously permits the economic...
US4785182 (A), filed
Thu May 21 00:00:00 CDT 1987
, published
Tue Nov 15 00:00:00 CST 1988
- ELECTROSCAN CORP
US6939434 (B2), filed
Wed Jun 05 00:00:00 CDT 2002
, published
Tue Sep 06 00:00:00 CDT 2005
- APPLIED MATERIALS INC
A plasma reactor is described that includes a vacuum chamber defined by an enclosure including a side wall and a workpiece support pedestal within the chamber defining a processing region overlying said pedestal. The chamber has at least a first pair of ports...
US6331702 (B1), filed
Mon Jan 25 00:00:00 CST 1999
, published
Tue Dec 18 00:00:00 CST 2001
- UNIV MANITOBA
A method and apparatus are provided for providing an ion transmission device or interface between an ion source and a spectrometer. The ion transmission device can include a multipole rod set and includes a damping gas, to damp spatial and energy spreads of...
US6822222 (B2), filed
Tue Jan 08 00:00:00 CST 2002
, published
Tue Nov 23 00:00:00 CST 2004
- UNIV JOHNS HOPKINS
A controller that processes the mass spectrum of a sample provided by a detector of a mass spectrometer, for example, by a field portable mass spectrometer system. The controller provides a constant false alarm rate (CFAR) processing of the mass spectral data...
US4517223 (A), filed
Fri Sep 24 00:00:00 CDT 1982
, published
Tue May 14 00:00:00 CDT 1985
- SOVONICS SOLAR SYSTEMS
A process for making amorphous semiconductor alloy films and devices at high deposition rates utilizes microwave energy to form a deposition plasma. The alloys exhibit high quality electronic properties suitable for many applications including photovoltaic...
US5703358 (A), filed
Mon Sep 11 00:00:00 CDT 1995
, published
Tue Dec 30 00:00:00 CST 1997
- TELEDYNE ELECTRONIC TECH
A method for generating a filtered noise signal, which includes the steps of generating a broadband signal having optimized (reduced or minimized) dynamic range, and filtering the broadband signal in a notch filter to generate a broadband signal whose...
US5173638 (A), filed
Thu Jun 27 00:00:00 CDT 1991
, published
Tue Dec 22 00:00:00 CST 1992
- BBC BROWN BOVERI CIE
The high-power radiator includes a discharge space (12) bounded by a metal electrode (8), cooled on one side, and a dielectric (9) and filled with a noble gas or gas mixture, both the dielectric (9) and also the other electrode situated on the surface of the...
US5477105 (A), filed
Mon Jan 31 00:00:00 CST 1994
, published
Tue Dec 19 00:00:00 CST 1995
- SILICON VIDEO CORP
A light-emitting structure (306) contains a main section (302), a pattern of ridges (314) situated along the main section, and a plurality of light-emissive regions (313) situated in spaces between the ridges. The light-emissive regions produce light of...
US6225756 (B1), filed
Fri Jul 14 00:00:00 CDT 2000
, published
Tue May 01 00:00:00 CDT 2001
- FUSION LIGHTING INC
An oscillator includes an amplifier having an input and an output, and an impedance transformation network connected between the input of the amplifier and the output of the amplifier, wherein the impedance transformation network is configured to provide...
US4226897 (A), filed
Mon Dec 05 00:00:00 CST 1977
, published
Tue Oct 07 00:00:00 CDT 1980
- PLASMA PHYSICS CORP
In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting...
US4261762 (A), filed
Fri Sep 14 00:00:00 CDT 1979
, published
Tue Apr 14 00:00:00 CST 1981
- EATON CORP
A method and apparatus are disclosed for providing heat conduction between an article being treated in a vacuum and a support member by providing a gas under pressure of about 0.5 to 2.0 Torr between the article and the support member. The method and apparatus...
US6214119 (B1), filed
Wed Nov 18 00:00:00 CST 1998
, published
Tue Apr 10 00:00:00 CDT 2001
- APPLIED MATERIALS INC
The present invention includes plural plasma processing vessels and a wafer queuing station arrayed with a wafer transfer arm in a controlled environment. Wafers are movable within the controlled environment one at a time selectably between the several plasma...
US6169356 (B1), filed
Thu Jun 23 00:00:00 CDT 1994
, published
Tue Jan 02 00:00:00 CST 2001
- CANON KK
An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film arranged between the electrodes and including a high resistance region. The high resistance region has a deposit containing carbon as a principal...
US6830823 (B1), filed
Fri Oct 27 00:00:00 CDT 2000
, published
Tue Dec 14 00:00:00 CST 2004
- SUPERIOR MICROPOWDERS LLC
Gold powders and methods for producing gold powders. The powders preferably have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes...
US4328258 (A), filed
Wed Oct 24 00:00:00 CDT 1979
, published
Tue May 04 00:00:00 CDT 1982
- PLASMA PHYSICS CORP
In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting...
US6776846 (B2), filed
Thu Apr 25 00:00:00 CDT 2002
, published
Tue Aug 17 00:00:00 CDT 2004
- APPLIED MATERIALS INC
An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A...
US5357172 (A), filed
Mon Feb 01 00:00:00 CST 1993
, published
Tue Oct 18 00:00:00 CDT 1994
- MICRON TECHNOLOGY INC
In a flat panel display in which low-voltage row and column address signals control a much higher pixel activation voltage by respectively gating at least one pair of series coupled MOSFETs to ground for each pixel, effective current regulation is achieved by...
US5556501 (A), filed
Thu Apr 01 00:00:00 CST 1993
, published
Tue Sep 17 00:00:00 CDT 1996
- APPLIED MATERIALS INC
A domed plasma reactor chamber uses an antenna driven by RF energy (LF, MF, or VHF) which is inductively coupled inside the reactor dome. The antenna generates a high density, low energy plasma inside the chamber for etching metals, dielectrics and semiconduct...
US5274233 (A), filed
Thu May 14 00:00:00 CDT 1992
, published
Tue Dec 28 00:00:00 CST 1993
- TELEDYNE MEC
A mass spectrometry method in which one or more high power supplemental AC voltage signals and one or more low power supplemental AC voltage signals are applied to an ion trap. The frequency of each supplemental AC voltage is selected to match a resonance...
US5436445 (A), filed
Tue May 31 00:00:00 CDT 1994
, published
Tue Jul 25 00:00:00 CDT 1995
- TELEDYNE ELECTRONIC TECH
A mass spectrometry method in which an improved field comprising two or more trapping fields having substantially identical spatial form is established and at least one parameter of the improved field is changed to excite selected trapped ions sequentially for...
US7077882 (B2), filed
Fri Jul 16 00:00:00 CDT 2004
, published
Tue Jul 18 00:00:00 CDT 2006
- CABOT CORP
Gold powders and methods for producing gold powders. The powders preferably have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes...
US4585668 (A), filed
Thu Aug 16 00:00:00 CDT 1984
, published
Tue Apr 29 00:00:00 CDT 1986
- UNIV MICHIGAN
A method for etching or chemically treating a surface of an article utilizing a radio frequency wave ion generating apparatus which provides a thin disk shaped plasma is described. The plasma disks can have a relatively large diameter (on the order of...
US5424605 (A), filed
Fri Apr 10 00:00:00 CDT 1992
, published
Tue Jun 13 00:00:00 CDT 1995
- SILICON VIDEO CORP
A flat screen cathode ray tube is self supporting of a phosphor coated glass face place in that a multiplicity of support points or lines of support extend from an addressing grid structure to contact the inside surface of the face plate between pixels. A...
US5462467 (A), filed
Wed Sep 08 00:00:00 CDT 1993
, published
Tue Oct 31 00:00:00 CST 1995
- SILICON VIDEO CORP
A field-emission structure suitable for large-area flat-panel televisions centers around an insulating porous layer (24A) that overlies a lower conductive region (22) situated over insulating material of a supporting substrate (20). Electron-emissive filaments...
US6376981 (B1), filed
Tue Jun 22 00:00:00 CDT 1999
, published
Tue Apr 23 00:00:00 CDT 2002
- PHILIPS CORP
The invention relates to a color display device comprising an in-line electron gun (5) for generating three electron beams (6,7,8), and a convergence unit (14) to dynamically influence the convergence of the electron beams, preferably to decrease a distance...
US4727293 (A), filed
Mon Apr 07 00:00:00 CST 1986
, published
Tue Feb 23 00:00:00 CST 1988
- UNIV MICHIGAN
An improved ion generating apparatus for producing a plasma disk using magnets 34 and 35 around a region 16 in a chamber 15 positioned in a microwave cavity is described. The apparatus is particularly operated at a microwave frequency such that electron...
US6413320 (B2), filed
Tue Feb 13 00:00:00 CST 2001
, published
Tue Jul 02 00:00:00 CDT 2002
- APPLIED MATERIALS INC
An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A...
US6274972 (B1), filed
Mon Mar 23 00:00:00 CST 1998
, published
Tue Aug 14 00:00:00 CDT 2001
- CANON KK
An electron beam apparatus includes an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a...
US6679937 (B1), filed
Fri Jun 02 00:00:00 CDT 2000
, published
Tue Jan 20 00:00:00 CST 2004
- CABOT CORP
Copper metal powders, methods for producing copper metal powders and products incorporating the powders. The copper metal powders have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the metal particles...
US6712664 (B2), filed
Mon Jul 08 00:00:00 CDT 2002
, published
Tue Mar 30 00:00:00 CST 2004
- MICRON TECHNOLOGY INC
An apparatus and a method for stabilizing the threshold voltage in an active matrix field emission device. The method includes the formation of radiation-blocking elements between a cathodoluminescent display screen of the FED and semiconductor junctions...
US4494037 (A), filed
Thu Sep 09 00:00:00 CDT 1982
, published
Tue Jan 15 00:00:00 CST 1985
- PHILIPS CORP
An improved gas discharge display device is provided having an envelope of at least one glass plate with an electrode pattern thereon. The electrode pattern is formed into small surface elements constituting cathode areas, and is provided in facing relationshi...
US5242539 (A), filed
Fri Mar 27 00:00:00 CST 1992
, published
Tue Sep 07 00:00:00 CDT 1993
- HITACHI LTD
A plasma treatment method and apparatus utilize various gas inlet and outlet structure arrangements to optimize treatment characteristics for a semiconductor wafer. A buffer zone is created between gas inlets and the discharge zone of the vacuum treatment...
US4615905 (A), filed
Mon Apr 22 00:00:00 CST 1985
, published
Tue Oct 07 00:00:00 CDT 1986
- ENERGY CONVERSION DEVICES INC
A method of depositing a semiconductor alloy film onto a substrate by activating groups of free radicals and incorporating desired ones of the activated groups into the film.
US6051834 (A), filed
Thu Jul 30 00:00:00 CDT 1998
, published
Tue Apr 18 00:00:00 CDT 2000
- HITACHI LTD
3-dimensional observation on the atomic arrangement and atomic species in a thin-film specimen are carried out at high speed and accuracy by an electron microscope which measures electrons emitted at high angle from the specimen. A scanning transmission...
US7004994 (B2), filed
Mon Feb 09 00:00:00 CST 2004
, published
Tue Feb 28 00:00:00 CST 2006
- CABOT CORP
Provided are silver-containing powders and a method and apparatus for manufacturing the silver-containing particles of high quality, of a small size and narrow size distribution. An aerosol is generated from liquid feed and sent to a furnace, where liquid in...
US6660680 (B1), filed
Wed Mar 22 00:00:00 CST 2000
, published
Tue Dec 09 00:00:00 CST 2003
- SUPERIOR MICROPOWDERS LLC
Electrocatalyst powders and methods for producing electrocatalyst powders, such as carbon composite electrocatalyst powders. The powders have a well-controlled microstructure and morphology. The method includes forming the particles from an aerosol of...
US5233191 (A), filed
Tue Apr 02 00:00:00 CST 1991
, published
Tue Aug 03 00:00:00 CDT 1993
- HITACHI LTD
Method and apparatus of detecting, analyzing and evaluating the content of foreign matters such as dusts and impurities contained in various materials, units, processes and environment standing for constituting components of a mass production line during mass...
US6573643 (B1), filed
Mon Oct 02 00:00:00 CDT 2000
, published
Tue Jun 03 00:00:00 CDT 2003
- SI DIAMOND TECHN INC
A field emission cathode for use in flat panel displays is described including a layer of conductive material and a layer of amorphic diamond film, functioning as a low effective work-function material, deposited over the conductive material to form emission...
US4585673 (A), filed
Wed Apr 03 00:00:00 CST 1985
, published
Tue Apr 29 00:00:00 CDT 1986
- GTE LABORATORIES INC
Disclosed is a method for applying a continuous protective coating to the surface of individual phosphor particles. The method involves chemical vapor deposition of the protective coating on individual particles of a phosphor powder while the phosphor...
US5153900 (A), filed
Wed Sep 05 00:00:00 CDT 1990
, published
Tue Oct 06 00:00:00 CDT 1992
- PHOTOELECTRON CORP
A low-level, electron beam activated source of preselected or programmable duration and intensity x-rays. The source may be fully or partially implanted into, or surface-mounted onto a desired area to affect a preselected irradiated region. In medical...
US5868854 (A), filed
Tue Dec 08 00:00:00 CST 1992
, published
Tue Feb 09 00:00:00 CST 1999
- HITACHI LTD
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample...
US6656846 (B2), filed
Thu May 03 00:00:00 CDT 2001
, published
Tue Dec 02 00:00:00 CST 2003
- HITACHI LTD
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample...
US6489718 (B1), filed
Tue Jul 18 00:00:00 CDT 2000
, published
Tue Dec 03 00:00:00 CST 2002
- CANDESCENT TECH CORP
A spacer (140) suitable for use in a flat panel display is formed with ceramic, transition metal, and oxygen. At least part of the oxygen is bonded to the transition metal or/and constituents of the ceramic to form a uniform electrically resistive material...
US7223676 (B2), filed
Mon May 03 00:00:00 CDT 2004
, published
Tue May 29 00:00:00 CDT 2007
- APPLIED MATERIALS INC
A low temperature process for depositing a coating containing any of silicon, nitrogen, hydrogen or oxygen on a workpiece includes placing the workpiece in a reactor chamber facing a processing region of the chamber, introducing a process gas containing any of...
US6011259 (A), filed
Fri Aug 09 00:00:00 CDT 1996
, published
Tue Jan 04 00:00:00 CST 2000
- ANALYTICA OF BRANFORD INC
A Time-Of-Flight (TOF) mass analyzer is configured with a multipole ion guide in the ion path between the ion source and pulsing region of the mass analyzer, and enables trapping or transmission of ions from an atmospheric pressure ion source. The mass-to-char...
US4967088 (A), filed
Thu Jun 02 00:00:00 CDT 1988
, published
Tue Oct 30 00:00:00 CST 1990
- OESTERR INVESTITIONSKREDIT
In an ion projection lithography system, apparatus and methods for positioning on a substrate or wafer at a target station an image of structures provided on a mask, wherein the mask includes reference marks to provide ion reference beams about the image...
US5621780 (A), filed
Thu Jul 27 00:00:00 CDT 1995
, published
Tue Apr 15 00:00:00 CDT 1997
- PHOTOELECTRON CORP
The present invention is directed to an x-ray source for irradiating a surface defining a body cavity in accordance with a predetermined dose distribution. The source comprises a housing, an elongated tubular probe, a target assembly, and an inflatable...
US5581591 (A), filed
Mon Nov 28 00:00:00 CST 1994
, published
Tue Dec 03 00:00:00 CST 1996
- PICKER INT INC
An x-ray tube includes an anode (A) and an envelope (C). A cathode assembly (B) which is supported in the envelope on a bearing (32) emits a beam of electrons which strike the anode forming a focal spot. The anode rotates (D) relative to the cathode such that...
US5066883 (A), filed
Wed Jul 13 00:00:00 CDT 1988
, published
Tue Nov 19 00:00:00 CST 1991
- CANON KK
US7172663 (B2), filed
Tue Mar 02 00:00:00 CST 2004
, published
Tue Feb 06 00:00:00 CST 2007
- CABOT CORP
Provided are palladium-containing powders and a method and apparatus for manufacturing the palladium-containing particles of high quality, of a small size and narrow size distribution. An aerosol is generated from liquid feed and sent to a furnace, where...
US6246168 (B1), filed
Fri Jul 28 00:00:00 CDT 1995
, published
Tue Jun 12 00:00:00 CDT 2001
- CANON KK
An electron-emitting device includes a pair of electrodes and an electroconductive film arranged between the electrodes and including an electron-emitting region carrying a graphite film. The graphite film shows, in a Raman spectroscopic analysis using a laser...
US5749763 (A), filed
Wed Jun 07 00:00:00 CDT 1995
, published
Tue May 12 00:00:00 CDT 1998
- CANON KK
A display device consists of an electron-emitting device which is a laminate of an insulating layer and a pair of opposing electrodes formed on a planar substrate. A portion of the insulating layer is between the electrodes and a portion containing an electron...
US6802752 (B1), filed
Mon Jun 14 00:00:00 CDT 1999
, published
Tue Oct 12 00:00:00 CDT 2004
- CANON KK
An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film arranged between the electrodes and including a high resistance region. The high resistance region has a deposit containing carbon as a principal...
US5199918 (A), filed
Thu Nov 07 00:00:00 CST 1991
, published
Tue Apr 06 00:00:00 CDT 1993
- MICROELECTRONICS COMPUTER
A field emitter device comprising a conductive metal and a diamond emission tip with negative electron affinity in ohmic contact with and protruding above the metal. The device is fabricated by coating a substrate with an insulating diamond film having...
US6333273 (B1), filed
Mon Aug 28 00:00:00 CDT 2000
, published
Tue Dec 25 00:00:00 CST 2001
- HITACHI LTD
A method and apparatus for dry etching changes at least one of the effective pumping speed of a vacuum chamber and the gas flow rate to alter the processing of an etching pattern side wall of a sample between first and second conditions. The first and second...
US5717204 (A), filed
Mon Feb 26 00:00:00 CST 1996
, published
Tue Feb 10 00:00:00 CST 1998
- KLA INSTR CORP
An apparatus scans an electron beam across an optical phase shift mask and automatically inspects the mask to determine the features of the phase shift mask and classification of defects. An electron beam is directed at the surface of a mask for scanning that...
US6277169 (B1), filed
Tue Feb 24 00:00:00 CST 1998
, published
Tue Aug 21 00:00:00 CDT 2001
- SUPERIOR MICROPOWDERS LLC
Provided are silver-containing powders and a method and apparatus for manufacturing the silver-containing particles of high quality, of a small size and narrow size distribution. An aerosol is generated from liquid feed and sent to a furnace, where liquid in...
US5134286 (A), filed
Thu Feb 28 00:00:00 CST 1991
, published
Tue Jul 28 00:00:00 CDT 1992
- TELEDYNE CME
A mass spectrometry method in which notch-filtered noise is applied to an ion trap to resonate all ions except selected ions out of the region of the trapping field. Preferably, the trapping field is a quadrupole trapping field defined by a ring electrode and...
US6136721 (A), filed
Tue Jan 11 00:00:00 CST 2000
, published
Tue Oct 24 00:00:00 CDT 2000
- HITACHI LTD
A method and apparatus for dry etching changes at least one of the effective pumping speed of a vacuum chamber and the gas flow rate to alter the processing of an etching pattern side wall of a sample between first and second conditions. The first and second...
US7118996 (B1), filed
Thu Jan 21 00:00:00 CST 1999
, published
Tue Oct 10 00:00:00 CDT 2006
- SEMICONDUCTOR ENERGY LAB
There is proposed an apparatus for doping a material to be doped by generating plasma (ions) and accelerating it by a high voltage to form an ion current is proposed, which is particularly suitable for processing a substrate having a large area. The ion...
US5541466 (A), filed
Fri Nov 18 00:00:00 CST 1994
, published
Tue Jul 30 00:00:00 CDT 1996
- TEXAS INSTRUMENTS INC
The emitter plate 60 of a field emission flat panel display device includes a layer 68 of a resistive material and a mesh-like structure 62 of an electrically conductive material. A conductive plate 78 is also formed on top of resistive coating 68 within the...
US5653619 (A), filed
Tue Sep 06 00:00:00 CDT 1994
, published
Tue Aug 05 00:00:00 CDT 1997
- MICRON TECHNOLOGY INC
A selective etching and chemical mechanical planarization process is employed for the formation of self-aligned gate and focus ring structures surrounding an electron emission tip for use in field emission displays. The process is employed to construct an...
US6114695 (A), filed
Mon May 10 00:00:00 CDT 1999
, published
Tue Sep 05 00:00:00 CDT 2000
- HITACHI LTD
An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron...
US6157123 (A), filed
Fri Feb 26 00:00:00 CST 1999
, published
Tue Dec 05 00:00:00 CST 2000
- CANDESCENT TECH CORP
A flat panel display contains a faceplate structure (174 or 350), a backplate structure (175 or 351), and a spacer (140, 340, 0r 341). A light-emitting structure (171 or 306) is located along a faceplate (170 or 302) in the faceplate structure. An electron-emi...
US5965192 (A), filed
Mon Jul 28 00:00:00 CDT 1997
, published
Tue Oct 12 00:00:00 CDT 1999
- ADVANCED VISION TECH INC
A phosphor comprises, in atomic percentages, 90% to 100% of a mixed metal oxide MxTyOz, wherein M is a metal selected from Zn, Sn, In, Cu, and combinations thereof, T is a refractory metal selected from Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, and combinations...
US6270687 (B1), filed
Thu Apr 27 00:00:00 CDT 2000
, published
Tue Aug 07 00:00:00 CDT 2001
- APPLIED MATERIALS INC
An RF plasma etch reactor having an etch chamber with electrically conductive walls and a protective layer forming the portion of the walls facing the interior of the chamber. The protective layer prevents sputtering of material from the chamber walls by a...
US6015326 (A), filed
Mon Jul 28 00:00:00 CDT 1997
, published
Tue Jan 18 00:00:00 CST 2000
- ADVANCED VISION TECH INC
An electron field-emission display comprises one or more display cell structures, each having a field-emission cathode and an anode comprising at least one of several cathodoluminescent phosphors disclosed which are stimulable by electrons of very low energy....
US4504518 (A), filed
Mon Apr 30 00:00:00 CDT 1984
, published
Tue Mar 12 00:00:00 CST 1985
- ENERGY CONVERSION DEVICES INC
A low pressure process for making amorphous semiconductor alloy films and devices at high deposition rates and high gas conversion efficiencies utilizes microwave energy to form a deposition plasma. The alloys exhibit high-quality electronic properties...
US7083747 (B2), filed
Mon Nov 01 00:00:00 CST 2004
, published
Tue Aug 01 00:00:00 CDT 2006
- CABOT CORP
Provided is an aerosol method, and accompanying apparatus, for preparing powdered products of a variety of materials involving the use of an ultrasonic aerosol generator ( 106 ) including a plurality of ultrasonic transducers ( 120 ) underlying and ultrasonica...
US5594245 (A), filed
Fri Feb 10 00:00:00 CST 1995
, published
Tue Jan 14 00:00:00 CST 1997
- HITACHI LTD
An electron beam, which can transmit through part of a specimen and can reach a portion that is not exposed to the electron beam, is irradiated, and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the...
US5814924 (A), filed
Thu Jun 01 00:00:00 CDT 1995
, published
Tue Sep 29 00:00:00 CDT 1998
- SEIKO EPSON CORP
A display including plural field emission devices arranged in a pixel matrix. Each of these field emission devices includes an opening in an insulating layer of a supporting substrate, an upwardly extending cathode having a tip disposed centrally within the...
US4736101 (A), filed
Tue Aug 11 00:00:00 CDT 1987
, published
Tue Apr 05 00:00:00 CDT 1988
- FINNIGAN CORP
A simple and economical method of mass analyzing a sample by means of a quadrupole ion trap mass spectrometer in an MS/MS mode comprises the steps of forming ions within a trap structure, changing the RF and DC voltages in such a way that the ions with...
US7335282 (B2), filed
Mon Sep 13 00:00:00 CDT 2004
, published
Tue Feb 26 00:00:00 CST 2008
- FU JIANMING
A sputtering process and magnetron especially advantageous for low-pressure plasma sputtering or sustained self-sputtering, in which the magnetron has a reduced area but full target coverage. The magnetron includes an outer pole face surrounding an inner pole...
US6734022 (B2), filed
Thu Mar 15 00:00:00 CST 2001
, published
Tue May 11 00:00:00 CDT 2004
- BAYLOR COLLEGE MEDICINE
This invention relates generally to methods and apparatus for desorption and ionization of analytes for the purpose of subsequent scientific analysis by such methods, for example, as mass spectrometry or biosensors. More specifically, this invention relates to...
US7351470 (B2), filed
Mon Apr 29 00:00:00 CDT 2002
, published
Tue Apr 01 00:00:00 CDT 2008
- 3M INNOVATIVE PROPERTIES CO
An antireflection film and method of making same includes a substrate having a first surface and a second surface, an inorganic layer deposited on the first surface of the substrate, and an optically active polymer layer formed by curing a curable composition...
US5795206 (A), filed
Fri Sep 15 00:00:00 CDT 1995
, published
Tue Aug 18 00:00:00 CDT 1998
- MICRON TECHNOLOGY INC
A process is provided for forming spacers useful in large area displays. The process comprises steps of: forming bundles or boules comprising fiber strands which are held together with a binder; slicing the bundles or boules into slices; adhering the slices on...
US4503329 (A), filed
Wed Sep 29 00:00:00 CDT 1982
, published
Tue Mar 05 00:00:00 CST 1985
- HITACHI LTD
Disclosed is an ion beam processing apparatus comprising within a vacuum container a specimen chamber with a table for mounting a specimen provided therein, a high intensity ion source, such as a liquid metal ion source or an electric field ionizing ion source...
US4227117 (A), filed
Tue Apr 24 00:00:00 CST 1979
, published
Tue Oct 07 00:00:00 CDT 1980
- MATSUSHITA ELECTRIC IND CO LTD
A picture display device comprising an electron source for producing band-shaped electron beams, electron beam control means for controlling the selective passage of the electron beams, deflection means for horizontally and vertically deflecting the electron...
US5872358 (A), filed
Fri Oct 18 00:00:00 CDT 1996
, published
Tue Feb 16 00:00:00 CST 1999
- HITACHI LTD
A scanning microscope is provided for producing a scan image at high spatial resolution and in a low acceleration voltage area. An acceleration tube is located in an electron beam path of an objective lens for applying a post-acceleration voltage of the...
US5712479 (A), filed
Fri Dec 01 00:00:00 CST 1995
, published
Tue Jan 27 00:00:00 CST 1998
- INDIANA UNIVERSITY FOUNDATION
An apparatus and method for minimizing ion peak width measurements in a time-of-flight mass spectrometer to thereby minimize the effects of initial ion position distributions and initial ion velocity distributions on the mass resolution of the spectrometer are...
US6180029 (B1), filed
Tue Feb 24 00:00:00 CST 1998
, published
Tue Jan 30 00:00:00 CST 2001
- SUPERIOR MICROPOWDERS LLC
Phosphor powders and a method for making phosphor powders. The powders are oxygen-containing, such as metal oxides, silicates, borates or titanates and have a small particle size, narrow particle size distribution and are substantially spherical. The method of...
US6252346 (B1), filed
Fri Jul 14 00:00:00 CDT 2000
, published
Tue Jun 26 00:00:00 CDT 2001
- FUSION LIGHTING INC
An integrated lamp head for an electrodeless lamp includes a metal-matrix composite enclosure, an insulating ceramic encased by the metal-matrix enclosure, the insulating ceramic having an interior surface, and an excitation structure integrally formed on the...
US4990229 (A), filed
Tue Jun 13 00:00:00 CDT 1989
, published
Tue Feb 05 00:00:00 CST 1991
- PLASMA MATERIALS TECH
US5200613 (A), filed
Fri Aug 30 00:00:00 CDT 1991
, published
Tue Apr 06 00:00:00 CDT 1993
- TELEDYNE MEC
A mass spectrometry method in which a supplemental AC voltage signal having at least one high power frequency component, and at least one low power frequency component, is applied to an ion trap. Each high power component has an amplitude sufficiently large to...
US5422926 (A), filed
Fri Jan 21 00:00:00 CST 1994
, published
Tue Jun 06 00:00:00 CDT 1995
- PHOTOELECTRON CORP
The present invention is directed to an x-ray source for irradiating a volume in accordance with a predetermined dose distribution. The source comprises a housing, an elongated tubular probe, and a target assembly. The housing encloses an electron beam source...
US6891610 (B2), filed
Thu Sep 20 00:00:00 CDT 2001
, published
Tue May 10 00:00:00 CDT 2005
- KLA TENCOR TECH CORP
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection...
US4971667 (A), filed
Fri Feb 03 00:00:00 CST 1989
, published
Tue Nov 20 00:00:00 CST 1990
- SEMICONDUCTOR ENERGY LAB
