Simulation program for integrated optical/electronic circuit - Patent US7409327(B2)

Filed: Feb 15, 2002

Published: Aug 05, 2008

Abstract

A method for forming a hybrid active electronic and optical circuit using a lithography mask. The hybrid active electronic and optical circuit comprising an active electronic device and at least one optical device on a Silicon-On-Insulator (SOI) wafer. The SOI wafer including an insulator layer and an upper silicon layer. The upper silicon layer including at least one component of the active electronic device and at least one component of the optical device. The method comprising projecting the lithography mask onto the SOI waver in order to simultaneously pattern the component of the active electronic device and the component of the optical device on the SOI wafer.

Applicants

SIOPTICAL INC

Inventors

DELIWALA SHRENIK

Application Number

10076920

Priority Claims

US29720801

Family Members

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Classification Codes

G06F17/50, G02F1/25, G02B6/10, H01L27/12, G02B6/122, G02F1/01, G02B6/124, G02B6/34, G02B6/28, G02B27/28, G02B6/12, G02B6/42, G02B5/04, G02B6/43, G02F1/15, G02F1/295, G02F1/29