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Integrated processing system having multiple reactors connected to a central chamber - Patent US6776846(B2)

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Filed: Apr 25, 2002
Published: Aug 17, 2004

Abstract

An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A wafer transfer arm capable of R-Theta motion can transfer wafers between the queuing station and any of the plasma reactors in either a single-step or a multi-step process.

Applicants

  • APPLIED MATERIALS INC

Inventors

  • ZAFIROPOULO ARTHUR W
  • NAPOLI JOSEPH D
  • MILLER MARK W
  • VOWLES E JOHN
  • MAHER JOSEPH A

Application Number

10131243

Priority Claims

US85377586

Family Members

US2002174952(A1) - Integrated processing system having multiple reactors connected to a central chamber
US6776846(B2) - Integrated processing system having multiple reactors connected to a central chamber

Classification Codes

H01J37/02, H01L21/67, H01L21/00, H01L21/677, H01J37/18
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