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Method for fabricating a semiconductor interconnect with laser machined electrical paths through substrate - Patent US6107109(A)

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Filed: Dec 18, 1997
Published: Aug 22, 2000

Abstract

An interconnect for semiconductor components such as dice, wafers and chip scale packages is provided. The interconnect includes a substrate, and patterns of contacts formed on a face side of the substrate adapted to electrically engage external contacts (e.g., bond pads, solder bumps) on the components. The interconnect also includes insulated conductive members through the substrate, which provide direct electrical paths from the interconnect contacts to a backside of the substrate. The conductive members can be formed by laser machining openings in the substrate, and then filling the openings with a conductive material (e.g., metal, conductive polymer). The conductive members can also include pads with contact balls, configured for electrical interface with a test apparatus, such as test carrier or wafer handler. The interconnect can be used to construct test systems for testing semiconductor components, or to construct chip scale packages and multi chip modules.

Applicants

  • MICRON TECHNOLOGY INC

Inventors

  • FARNWORTH WARREN M
  • WOOD ALAN G
  • AKRAM SALMAN

Application Number

993965

Priority Claims

US99396597

Family Members

US6107109(A) - Method for fabricating a semiconductor interconnect with laser machined electrical paths through substrate
US6114240(A) - Method for fabricating semiconductor components using focused laser beam
US6294837(B1) - Semiconductor interconnect having laser machined contacts

Classification Codes

H01L23/538, H01L23/12, H01L23/13, H01L23/52, H01L25/10, H05K1/03, H01L23/48, H01L21/48, H05K1/11, H01L21/02, H01L21/60, H01L21/70, H05K3/00, H01L21/768, H01L23/498
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