Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials - Patent US4133685(A)

Filed: Jan 17, 1978

Published: Jan 09, 1979

Abstract

A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated polyvinyl alcohol resin which is placed over a diazo based material.